New PDF release: Adhesion Measurement of Films & Coatings Vol.2

By Kash L. Mittal

This booklet records the complaints of the Second overseas Symposium on Adhesion dimension of movies and Coatings, held in Newark, NJ, October 25-27, 1999. because the First Symposium (Boston 1992) there were significant job in devising new, extra trustworthy and extra effective how one can degree adhesion of movies and coatings, which ended in the choice to prepare the Newark Symposium. movies and coatings are used for a number of reasons – useful, ornamental, protecting, and so on. – in a bunch of purposes. regardless of the aim or program of a movie or a coating, their enough adhesion to the underlying substrates is of paramount value. Concomitantly, the necessity to boost ideas for quantitative evaluation of adhesion of movies and coatings is all too noticeable. This quantity incorporates a overall of 20 papers, that have all been conscientiously peer reviewed and certainly transformed prior to inclusion. the themes comprise: dimension and research of interface adhesion; relative adhesion dimension for skinny movie buildings; adhesion checking out of challenging coatings via quite a few ideas; demanding situations and new instructions in scratch adhesion checking out of covered substrates; software of scratch attempt to diverse movies and coatings; assessment of coating-substrate adhesion via indentation experiments; dimension of interfacial fracture power in multifilm functions; laser prompted decohesion spectroscopy (LIDS) for measuring adhesion; pulsed laser strategy for evaluate of adhesion; blade adhesion try out; JKR adhesion try out; coefficient of thermal growth size; and residual stresses in diamond movies. This quantity, supplying the newest details, could be of significant price and curiosity to an individual operating within the region of adhesion dimension of movies and coatings.

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Therefore, any adhesion test that does not allow locus of failure analysis is useless. Acknowledgements The author expresses her thanks to Dr. Hedrick for low k ILD/Si02 sample preparation, Dr. Hay and Mr. Liniger for the SiN/Cu etchback sample preparation. REFERENCES 1. 2. 3. 4. 5. 6. 7. 8. 9. 10. 11. 12. 13. 14. 15. 16. 17. 18. 19. 20. 2 1. 22. P. Adhesion. 72. 269 (2000). D. Maugis and M. , 11. 1989 (1978). D. Techno1.. 10, 161 (1996). H. Dauskardt. Y. Kook, A. Kirtikar. L. O. S. ). 479, The Minerals, Metals & Materials Society (1997).

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